Abstract
In recent decades, memory device technology has advanced through active research and the development of innovative technologies. Single transistor-based flash memory device is one of the most widely used forms of memory devices because their device structure is simple and the scaling is feasible. A nano-floating gate memory (NFGM) device is a kind of flash memory devices that uses nanocrystals as a charge-trapping element. The use of nanocrystals has advantages over memory devices that rely on other methods such as discontinuous trap sites and controllable trap levels. Nowadays considerable progress has been made in the field of NFGM devices, and novel application areas have been explored extensively. This review article focuses on new technologies that are advancing these developments. The discussion highlights recent efforts and research activities regarding the fabrication and characterization of nonvolatile memory devices that use a nanocrystal layer as a charge-trapping element. The review concludes with an analysis of device fabrication strategies and device architectures of NFGM devices for possible application to devices that are organic, printed, and flexible.
Similar content being viewed by others
References
J. S. Lee, J. Mater. Chem. 21, 14097 (2011).
K. Kim and S. Y. Lee, Microelectron. Eng. 84, 1976 (2007).
R. Bez, E. Camerlenghi, A. Modelli, and A. Visconti, P. IEEE 91, 489 (2003).
S. Aritome, R. Shirota, G. Hemink, T. Endoh, and F. Masuoka, P. IEEE 81, 776 (1993).
C. A. P. Dearaujo, J. D. Cuchiaro, L. D. McMillan, M. C. Scott, and J. F. Scott, Nature 374, 627 (1995).
A. Fazio, MRS Bull. 29, 814 (2004).
H. F. Hamann, M. O’Boyle, Y. C. Martin, M. Rooks, and K. Wickramasinghe, Nat. Mater. 5, 383 (2006).
P. Pavan, R. Bez, P. Olivo, and E. Zanoni, P. IEEE 85, 1248 (1997).
R. Waser and M. Aono, Nat. Mater. 6, 833 (2007).
C. Golla P. Cappelletti, P. Olivo, E. Zanoni, Flash Memories, Kluwer Academic Publishers, Dordrecht, Netherlands (1999).
C. G. Hwang, P. IEEE 91, 1765 (2003).
Y. M. Kim and J. S. Lee, J. Appl. Phys. 104, 114115 (2008).
J. S. Lee and Q. X. Jia, Electron. Mater. Lett. 4, 95 (2008).
J. S. Lee, Gold Bull. 43, 189 (2010).
J. S. Lee et al., Jpn. J. Appl. Phys. Part 1 45, 3213 (2006).
S. Tiwari, F. Rana, H. Hanafi, A. Hartstein, E. F. Crabbe, and K. Chan, Appl. Phys. Lett. 68, 1377 (1996).
S. Tiwari, F. Rana, K. Chan, L. Shi, and H. Hanafi, Appl. Phys. Lett. 69, 1232 (1996).
H. I. Hanafi, S. Tiwari, and I. Khan, IEEE T. Electron Dev. 43, 1553 (1996).
Y. C. King, T. J. King, and C. M. Hu, IEEE T. Electron Dev. 48, 696 (2001).
J. De Blauwe, IEEE T. Nanotechnol. 1, 72 (2002).
Z. T. Liu, C. Lee, V. Narayanan, G. Pei, and E. C. Kan, IEEE T. Electron. Dev. 49, 1606 (2002).
Q. D. Ling, D. J. Liaw, C. X. Zhu, D. S. H. Chan, E. T. Kang, and K. G. Neoh, Prog. Polym. Sci. 33, 917 (2008).
D. V. Talapin, J. S. Lee, M. V. Kovalenko, and E. V. Shevchenko, Chem. Rev. 110, 389 (2010).
C. H. Lee, J. Meteer, V. Narayanan, and E. C. Kan, J. Electron. Mater. 34, 1 (2005).
K. C. Chan, P. F. Lee, and J. Y. Dai, Appl. Phys. Lett. 92, 223105 (2008).
Y. S. Lo, K. C. Liu, J. Y. Wu, C. H. Hou, and T. B. Wu, Appl. Phys. Lett. 93, 132907 (2008).
J. H. Kim, K. H. Baek, C. K. Kim, Y. B. Kim, and C. S. Yoon, Appl. Phys. Lett. 90, 123118 (2007).
H. Park, A. Kim, C. Lee, J. S. Lee, and J. Lee, Appl. Phys. Lett. 94, 213508 (2009).
D. J. Lee, S. S. Yim, K. S. Kim, S. H. Kim, and K. B. Kim, J. Appl. Phys. 107, 013707 (2010).
W. L. Leong, P. S. Lee, S. G. Mhaisalkar, T. P. Chen, and A. Dodabalapur, Appl. Phys. Lett. 90, 042906 (2007).
C. Lee, J. H. Kwon, J. S. Lee, Y. M. Kim, Y. Choi, H. Shin, J. Lee, and B. H. Sohn, Appl. Phys. Lett. 91, 153506 (2007).
J. S. Lee, Y. M. Kim, J. H. Kwon, H. Shin, B. H. Sohn, and J. Lee, Adv. Mater. 21, 178 (2009).
J. S. Lee, Y. M. Kim, J. H. Kwon, J. S. Sim, H. Shin, B. H. Sohn, and Q. X. Jia, Adv. Mater. 23, 2064 (2011).
W. L. Leong, P. S. Lee, A. Lohani, Y. M. Lam, T. Chen, S. Zhang, A. Dodabalapur, and S. G. Mhaisalkar, Adv. Mater. 20, 2325 (2008).
J. S. Lee, J. Cho, C. Lee, I. Kim, J. Park, Y. M. Kim, H. Shin, J. Lee, and F. Caruso, Nat. Nanotechnol. 2, 790 (2007).
S. Kolliopoulou et al., J. Appl. Phys. 94, 5234 (2003).
S. Koliopoulou, P. Dimitrakis, D. Goustouridis, P. Normand, C. Pearson, M. C. Petty, H. Radamson, and D. Tsoukalas, Microelectron. Eng. 83, 1563 (2006).
R. Muralidhar et al., Technical Digest of International Electron Devices Meeting, p. 601, IEEE, Washington, DC (2003).
C. Gerardi et al., IEEE T. Electron Dev. 54, 1376 (2007).
C. Gerardi, S. Lombardo, G. Ammendola, G. Costa, V. Ancarani, D. Mello, S. Giuffrida, and M. C. Plantamura, Microelectron. Reliab. 47, 593 (2007).
J. Sarkar, S. Dey, D. Shahrjerdi, and S. K. Banerjee, IEEE T. Electron Dev. 28, 449 (2007).
S. Jacob et al., Solid-State Electron. 52, 1452 (2008).
Z. C. Liu, F. L. Xue, Y. Su, Y. M. Lvov, and K. Varahramyan, IEEE T. Nanotechnol. 5, 379 (2006).
C. Novembre, D. Guerin, K. Lmimouni, C. Gamrat, and D. Vuillaume, Appl. Phys. Lett. 92, 103314 (2008).
M. F. Mabrook, Y. J. Yun, C. Pearson, D. A. Zeze, and M. C. Petty, Appl. Phys. Lett. 94, 173302 (2009).
Y. M. Kim, Y. S. Park, A. O’Reilly, and J. S. Lee, Electrochem. Solid-State Lett. 13, H134 (2010).
S. J. Kim, Y. S. Park, S. H. Lyu, and J. S. Lee, Appl. Phys. Lett. 96, 033302 (2010).
L. J. Zhen, W. H. Guan, L. W. Shang, M. Liu, and G. Liu, J. Phys. D-Appl. Phys. 41, 135111 (2008).
W. L. Leong, N. Mathews, S. Mhaisalkar, Y. M. Lam, T. P. Chen, and P. S. Lee, J. Mater. Chem. 19, 7354 (2009).
Y. M. Kim, S. J. Kim, and J. S. Lee, IEEE Electr. Device L. 31, 503 (2010).
S. J. Kim and J. S. Lee, Nano Lett. 10, 2884 (2010).
Y. S. Park, S. Chung, S. J. Kim, S. H. Lyu, J. W. Jang, S. K. Kwon, Y. Hong, and J. S. Lee, Appl. Phys. Lett. 96, 213107 (2010).
Y. S. Park, S. Y. Lee, and J. S. Lee, IEEE Electr. Device L. 31, 1134 (2010).
J. C. Park, S. Kim, C. Kim, I. Song, Y. Park, U. I. Jung, D. H. Kim, and J. S. Lee, Adv. Mater. 22, 5512 (2010).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Lee, JS. Review paper: Nano-floating gate memory devices. Electron. Mater. Lett. 7, 175–183 (2011). https://doi.org/10.1007/s13391-011-0901-5
Published:
Issue date:
DOI: https://doi.org/10.1007/s13391-011-0901-5
