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Papers
The changes in the free-carrier concentration in polycrystalline ZnO films during exposure to H 2... more
ABSTRACT
There is increasing interest in plasma etching of high aspect ratio structures in Si for semicond... more
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ABSTRACT
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Chemistry of Materials
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ABSTRACT
The changes in the free-carrier concentration in polycrystalline ZnO films during exposure to H 2... more
ABSTRACT
There is increasing interest in plasma etching of high aspect ratio structures in Si for semicond... more
ABSTRACT
ABSTRACT
ABSTRACT
ABSTRACT
ABSTRACT
ABSTRACT
ABSTRACT
ABSTRACT
Chemistry of Materials
ABSTRACT
ABSTRACT